Nanoimprinting

The Watkins group has extensive knowledge of the latest equipment and processes for nanoimprinting. Currently, we are developing Si-wafer based and R2R based large area nanoimprinting technology. The equipments are located at Conte Polymer Research Center and Life Science Laboratories. For more information, visit https://www.umass.edu/ials/roll-to-roll-fabrication

Nanonex NX-2608BA

The Nanonex Nanoimprint Lithography Tool provides state-of-the-art capability for patterning, alignment, and direct printing of multiple materials for printed electronics. The sheet-printing capability provides unprecedented pattering of critical features and aligment resolution.

Key Features all forms of Nanoimprint

  • Thermoplastic
  • Photocurable
  • Simultaneous thermal and UV NIL
  • Air Cushion Press (ACP) technology provides excellent uniformity over entire substrate
  • High Throughput
  • Sub 10 nm imprint resolution
  • Sub-1 µm Overlay alignment frontside and optional backside alignment
  • Smart sample holder
  • Substrate size – up to 8 inch wafers
  • Temperature range of 0 to 250°C
  • Pressure range of 0 to 500 psi
  • 200W Narrow band UV lamp
  • Automatic control
  • Alignment
  • X, Y, Z, Theta Stage
  • Split Field Optics and CCD Camera
  • Photolithography
  • 5 inch mask standard
  • UV source 500 W Mercury lamp
  • User friendly control software

R2R Nanoimprint Lithography

The R2R NanoImprint tool provides a unique suite of capabilities enabling innovative process development including patterning across multiple length-scales, and direct printing of a range of materials compositions.

  • Next Generation Tool Based on Nano Emboss 100 Platform
  • Adds Thermal Imprint, Solvent Assisted, Soft and Optical Contact Lithography
  • Equipped with NIR Anneal
  • Enables Direct Printing of Metal Oxides

R2R UV-NIL Tool

  • UMass NANOemBOSS R2R-NIL constructed with Carpe Diem Technologies (Franklin, MA)
  • Sub 50 nm features and feet per minute rates.

UV curing system

  • UV wavelength: 365 nm (currently there), 395 nm (coming soon)
  • Number of LEDs: 24
  • Total UV output (continuous): 192 W - 264 W (8 W - 11 W per LED)
  • Total UV output per exposure area (continuous): 7.07 W/in^2 - 9.72 W/in^2 (1.10 W/cm^2 - 1.51 W/cm^2)
  • Tray size: 8 in x 8 in
  • Exposure size: 5 in x 5.4325 in
  • Continuous and pulsed options
  • Custom software interface
  • Liquid-cooled tray & LED block
  • Gas purge option
  • Auxiliary power station
  • Interchangeable LED blocks

Spin coater

The Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).

Dry box

Dry boxes enable process development under controlled environments for repeatable, reliable results of nanoimprinting without any impurities.

  • N2 environment
  • Humidity controlled