Nanoimprinting
The Watkins group has extensive knowledge of the latest equipment and processes for nanoimprinting. Currently, we are developing Si-wafer based and R2R based large area nanoimprinting technology. The equipments are located at Conte Polymer Research Center and Life Science Laboratories. For more information, visit https://www.umass.edu/ials/roll-to-roll-fabrication
Nanonex NX-2608BAThe Nanonex Nanoimprint Lithography Tool provides state-of-the-art capability for patterning, alignment, and direct printing of multiple materials for printed electronics. The sheet-printing capability provides unprecedented pattering of critical features and aligment resolution. Key Features all forms of Nanoimprint
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R2R Nanoimprint LithographyThe R2R NanoImprint tool provides a unique suite of capabilities enabling innovative process development including patterning across multiple length-scales, and direct printing of a range of materials compositions.
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R2R UV-NIL Tool
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UV curing system
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Spin coaterThe Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer). |
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Dry boxDry boxes enable process development under controlled environments for repeatable, reliable results of nanoimprinting without any impurities.
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